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Beam homogenizing tolerant to incident beam size and beam quality

A laser beam with a top-hat uniform intensity distribution is desired in many applications. A top-hat beam is also called a flat-top beam or a super-Gaussian beam.

Basically we have 4 different solutions to homogenize a laser beam, i.e.

(1) flat-top beam shaping for a Gaussian beam with a specific beam size and good beam quality

(2) Beam homogenizing tolerant to incident beam size and beam quality

(3) beam homogenizing with speckles, tolerant to incident beam size and beam quality

(4) beam homogenizing for incoherent beams with microlenses

The diffractive optical elements (DOEs) designed based on our first approach are sensitive to the incident laser beam. Specifically,
1. The incident laser beam should be of Gaussian distribution.
2. The DOE has to be placed at the waist of the incident laser beam.
3. The incident beam spot size on the DOE should be the same as the designed value.
4. The lateral alignment should be accurate.

If all these four conditions are satisfied, the DOEs' performance will be good, otherwise one cannot obtain the desired flat-top output beam. By contrast, the DOEs designed based on the second approach are very tolerant to incident beam size and beam quality, without lateral or longitudinal alignment requirements.

The products that you are reading were designed and fabricated based on the second approach of homogenizing an incident laser beam.

       

Item Number

DOE receiving size

Wavelength

Diffaction angle

Description  
T-RD-50-18mm-1600mm-532 50 532 11.25 mrad£¨Fixed working distance) Datasheet New arrival on 2019.4.23
SFH-RD-12p5-25DEG-785 12.5 x 12.5 mm 785 nm 25 degree   £¨Internal Reference 73£©
SFH-RD-12.5-25DEG-785-S 12.5 x 12.5 mm 785 nm 25 degree Collimation of incident laser beam is not required £¨Internal Reference 81£©
SFH-REC-10-83p25x83p25mrad-532 10x10 mm 532 nm 83.25 x 83.25
mrad
Equivalent to 0.333x0.333mm @ 4 mm working distance
New arrival on 2016.11.2.
£¨Internal Reference 107£©
SFH-REC-50-4p3x11mrad-1064 ¦µ50 mm 1064 nm 4.3x11mrad Equivalent to 1.3x3.3mm @ 300 mm working distance

SFH-REC-50-2x5p3mrad-1064 ¦µ50 mm 1064 nm 2x5.3mrad Equivalent to 0.6x1.6mm @ 300 mm working distance  
SFH-REC-50-20x20mrad-1064 ¦µ50 mm 1064 nm 20x20mrad Equivalent to 6x6mm @ 300 mm working distance
.
SFH-REC-25-10mrad-1064 ¦µ25 mm 1064 nm 10mrad Equivalent to 3x3mm @ 300 mm working distance
New arrival on 2016.5.
9.
(Internal reference£º112)
SFH-RD-50-20mrad-1064 ¦µ50 mm 1064 nm 20mrad Equivalent to 6 mm in diameter round output spot @ 300 mm working distance
SFH-REC-30-p5xp5mrad-1064 30 x 30 mm 1064 nm 0.5x0.5 mrad Equivalent to a 30x30 micron output spot @ 60 mm working distance
Arrival on 2015.9.10.
(Internal reference£º62)
SFH-REC-12-p15xp45mrad-355 12 x 12 mm 355 nm

0.15x0.4 mrad

Equivalent to a 20x60 micron output spot @ 134 mm working distance  

SFH-REC-25-p15xp45mrad-355

25 x 25 mm

355 nm

0.15x0.45

mrad

Equivalent to a 20x60 micron output spot @ 134 mm working distance  

SFH-REC-18-4mrad-355

18 x 18 mm

355 nm

4x4 mrad

   

SFH-REC-18-5p2mrad-355

18 x 18 mm

355 nm

5.2x5.2 mrad

   
SFH-REC-12-p45x1p35mrad-1064 12 x 12 mm 1064 nm
0.45x1.35 mrad
   

Homogenizers tolerant to incident beam size and beam quality

Top-hat beam shaping elements

Image generation (general beam shaping) elements

Beam splitting elements

Beam homogenizer (diffuser)

Microlens array

Phase gratings for optical linear encoders

DOEs for motion sensing and gesture recognition systems

Laser keyboard by a diffractive optical element

DOEs, MEMS and other microstructures replication

Fused silica, quartz and sapphire wafers

TIFF / BMP to GDSII conversion

Company and products brochure (PDF£©£¨Updated on May 12 2014£©

Company and products brochure (PDF£©£¨Updated on July 4 2013£©

Company and products brochure (PDF£©£¨Updated on July 4 2012£©